The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2010
Filed:
Nov. 29, 2007
James D. Deakins, Fort Collins, CO (US);
Dennis J. Hansen, Loveland, CO (US);
Leonard J. Mahoney, Fort Collins, CO (US);
Tolga Erguder, Fort Collins, CO (US);
David M. Burtner, Belmont, MA (US);
James D. Deakins, Fort Collins, CO (US);
Dennis J. Hansen, Loveland, CO (US);
Leonard J. Mahoney, Fort Collins, CO (US);
Tolga Erguder, Fort Collins, CO (US);
David M. Burtner, Belmont, MA (US);
Veeco Instruments, Inc., Plainview, NY (US);
Abstract
An ion source, often used for materials processing applications in a vacuum processing chamber, is provided with an adaptive control system. The adaptive control system has a microprocessor and memory that regulate the inputs of power and gas flow into the ion source. The adaptive control system monitors and stores the dynamic input impedance properties and status of input devices to the ion source. The adaptive control system may additionally control magnetic fields within the ion source. The adaptive control system provides a multivariable control for driving any combination of input power, gas flow, magnetic field, or electrostatic ion beam extraction or acceleration field into the ion source.