The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2010
Filed:
Nov. 27, 2007
Kun-yi Lee, Taichung, TW;
Wei-ching Chuang, Taichung, TW;
Kuen-cherng Lin, Taichung, TW;
Cheng-che Lee, Taichung, TW;
Wei-yu Lee, Taichung, TW;
Kun-Yi Lee, Taichung, TW;
Wei-Ching Chuang, Taichung, TW;
Kuen-Cherng Lin, Taichung, TW;
Cheng-Che Lee, Taichung, TW;
Wei-Yu Lee, Taichung, TW;
China Institute of Technology, Taipei, TW;
Abstract
The present invention discloses a method for fabricating polymer wavelength filter with high-resolution periodical structure, which comprises: a positive photo-resister film is coated or a substrate, holographically exposed with grating pattern, and coated with a negative photo-resister film, then exposed by UV light and developed to obtain a waveguide mold having negative waveguide; a PDMS film coated on the waveguide mold, baked and peeled off to obtain a PDMS mold; a first tunnel formed over the PDMS mold, injected with a first UV polymer, then cured and separated the first UV polymer having groove to be the cladding layer of the polymer wavelength filter; a second UV polymer injected into the groove of the cladding layer, and cured to form the core of the waveguide in the groove of the cladding layer to finally be the polymer wavelength filter.