The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2010
Filed:
Jun. 27, 2005
Tomoki Kanesaka, Miyagi, JP;
Nobuhiro Kihara, Kanagawa, JP;
Tomoki Kanesaka, Miyagi, JP;
Nobuhiro Kihara, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
At the time of varying the angle of a scan mirror for varying the angle of incidence of a reference beam on a hologram recording material, the angle of a slit is also varied in conjunction, whereby the beam diameter of the reference beam is varied by the slit so that the irradiation range on the hologram recording material will be constant without being varied according to the variation in the incidence angle of the reference beam. This ensures that the area of irradiation of the hologram recording material with the reference beam can always be kept constant, even when the incidence angle of the reference beam is varied at the time of recording holograms by the angle multiplex recording system.