The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2010
Filed:
May. 25, 2007
Tomoyuki Miyashita, Utsunomiya, JP;
Tomoyuki Miyashita, Utsunomiya, JP;
Canon Kabushiki Kaisha, , JP;
Abstract
A method for calculating a correction amount to a focus amount or an exposure dose in exposing a substrate with an exposure apparatus includes a storing step of storing plural sets, each of which is a combination of a set focus amount, a set exposure dose, and first image information of a pattern formed on the substrate through an exposure with the set focus amount and the set exposure dose, the plural sets having different focus amounts and/or different exposure doses, an obtaining step of obtaining second image information of a pattern formed on the substrate through another exposure, and a selecting step of finding a correlation value between the second image information obtained in the obtaining step and the first image information in the plural sets stored in the storing step, and of selecting at least two sets having two highest correlation values among the plural sets.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile