The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7851724 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 14, 2010

Filed:

Feb. 22, 2007
Applicant:

Hiroyuki Hiiro, Ashigarakami-gun, JP;

Inventor:

Hiroyuki Hiiro, Ashigarakami-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/06 (2006.01); H01L 21/268 (2006.01);
U.S. Cl.
CPC ...
Abstract

A laser exposure which includes: a laser light source including a multi-transverse mode semiconductor laser; a far-field pattern forming optical system for forming a far-field pattern of multi-transverse mode laser light emitted from the laser light source; a condensing optical system for condensing the laser light emitted from the far-field pattern forming optical system and applying the condensed laser light to a substance to be exposed; and a coherency reducing element disposed in an optical path between the laser light source and the substance to be exposed, for reducing coherency of two wavefront components that are contained in high-order transverse mode light of each order emitted from the laser light source and propagate in substantially symmetrical directions with respect to the optical axis.


Find Patent Forward Citations

Hiiro, Hiroyuki. (2010). Laser exposure apparatus and laser annealing apparatus (U.S. Patent No. 7851724). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7851724

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