The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2010
Filed:
Mar. 27, 2006
Doetze Jakob Sikkema, Wageningen, NL;
David J Rodini, Midlothian, VA (US);
Hasan Dindi, Wilmington, DE (US);
James Arnold Schultz, Woolwich Township, NJ (US);
Georg Valentin Martin, Langenfeld, DE;
Ralf Demuth, Houston, TX (US);
Michael Schelhaas, Cologne, DE;
Doetze Jakob Sikkema, Wageningen, NL;
David J Rodini, Midlothian, VA (US);
Hasan Dindi, Wilmington, DE (US);
James Arnold Schultz, Woolwich Township, NJ (US);
Georg Valentin Martin, Langenfeld, DE;
Ralf Demuth, Houston, TX (US);
Michael Schelhaas, Cologne, DE;
E. I. du Pont de Nemours and Company, Wilmington, DE (US);
Magellan Systems International, LLC, Richmond, VA (US);
Abstract
Disclosed are processes for preparing monomer complexes that include contacting 2,3,5,6-tetraminopyridine free base in water with 2,5-dihydroxy terephthalic acid dipotassium salt to form an aqueous mixture, and adjusting the pH of the aqueous mixture to within the range of from about (3) to about (5) to precipitate the monomer complex. Processes of polymerizing the monomer complexes, polyareneazoles, filaments and yarns are also disclosed.