The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2010
Filed:
Aug. 21, 2007
Silvia Kronmueller, Schwaikheim, DE;
Tino Fuchs, Tuebingen, DE;
Ando Feyh, Tamm, DE;
Christina Leinenbach, Ensdorf, DE;
Marco Lammer, Stuttgart, DE;
Silvia Kronmueller, Schwaikheim, DE;
Tino Fuchs, Tuebingen, DE;
Ando Feyh, Tamm, DE;
Christina Leinenbach, Ensdorf, DE;
Marco Lammer, Stuttgart, DE;
Robert Bosch GmbH, Stuttgart, DE;
Abstract
A capping technology is provided in which, despite the fact that structures which are surrounded by a silicon-germanium filling layer are exposed using ClFetching through micropores in the silicon cap, an etching attack on the silicon cap is prevented, namely, either by particularly selective (approximately 10,000:1 or higher) adjustment of the etching process itself, or by using the finding that the oxide of a germanium-rich layer, in contrast to oxidized porous silicon, is not stable but instead may be easily dissolved, to protect the silicon cap.