The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2010
Filed:
Nov. 28, 2006
Applicants:
Jin Wu, Webster, NY (US);
Kenny-tuan Dinh, Webster, NY (US);
Kathleen M. Carmichael, Williamson, NY (US);
Michael S. Roetker, Webster, NY (US);
Liang-bih Lin, Rochester, NY (US);
Inventors:
Jin Wu, Webster, NY (US);
Kenny-Tuan Dinh, Webster, NY (US);
Kathleen M. Carmichael, Williamson, NY (US);
Michael S. Roetker, Webster, NY (US);
Liang-Bih Lin, Rochester, NY (US);
Assignee:
Xerox Corporation, Norwalk, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 15/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
A photoconductor containing an optional supporting substrate, a thiophosphate containing photogenerating layer, and a charge transport layer which includes a polyhedral oligomeric silsesquioxane (POSS)-containing material and an optional thiophosphate.