The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2010
Filed:
Apr. 18, 2005
Harald Wanka, Blaustein, DE;
Johann Georg Reichart, Blaubeuren, DE;
Hans-peter Voelk, Griesingen, DE;
Harald Wanka, Blaustein, DE;
Johann Georg Reichart, Blaubeuren, DE;
Hans-Peter Voelk, Griesingen, DE;
Centrotherm Photovoltaics AG, Blaubeuren, DE;
Abstract
The invention relates to a plasma reactor with high productivity for surface coating or modification of objects and/or substrates by plasma processes in a processing chamber, preferably as vacuum processes at reduced pressure, having an entrance lock to the processing chamber and an exit lock. The invention is to create a plasma reactor of high productivity, which, with uniformly high productivity, will make possible a rapid simple and selective cleaning of the plasma sources and adjacent parts of the processing chamber. According to the invention, two plasma sources () are provided, each alternately couplable to a reaction chamber () or a re-etching chamber (). The plasma sources () are fixed for this purpose to an alternating means () in such manner that the plasma sources () are positionable by a rotatory motion of the alternating means () in the reaction chamber () or the re-etching chamber ().