The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 14, 2010

Filed:

Apr. 10, 2009
Applicants:

Yuu Nishimura, Hadano, JP;

Tamaki Kobayashi, Isehara, JP;

Yusuke Miyamoto, Atsugi, JP;

Takuto Moriguchi, Chigasaki, JP;

Eiji Takeuchi, Atsugi, JP;

Takahiro Sato, Ebina, JP;

Inventors:

Yuu Nishimura, Hadano, JP;

Tamaki Kobayashi, Isehara, JP;

Yusuke Miyamoto, Atsugi, JP;

Takuto Moriguchi, Chigasaki, JP;

Eiji Takeuchi, Atsugi, JP;

Takahiro Sato, Ebina, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An electron-emitting device manufacturing method includes a first step of forming a conductive film on an insulating layer having an upper surface and a side surface connected to the upper surface via a corner portion so as to extend from the side surface to the upper surface and cover at least a part of the corner portion, and a second step of etching the conductive film in a film thickness direction. At the first step, the conductive film is formed so that film density of the conductive film on the side surface of the insulating layer becomes the same as or higher than film density of the conductive film on the upper portion of the insulating film.


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