The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2010
Filed:
Aug. 26, 2003
Kenji Yasuda, Tokyo, JP;
Takanori Ichiki, Tokyo, JP;
Kazunori Okano, Tokyo, JP;
Japan Science and Technology Agency, Saitama, JP;
Abstract
A microchamber including a glass substrate which is transparent to a specific wavelength, an absorbent region which absorbs the specific wavelength, and a melting substance region which does not absorb the specific wavelength, is solid at room temperature and melts when heated, which regions are layered on the glass substrate. The absorbent region, is irradiated with a focused light beam of the specific wavelength and locally heated in the vicinity of the converging rays, so that the melting substance region is locally melted at a portion adjacent to the absorbent region, thereby forming a cavity as the focused light beam moves. Accordingly, the shape of the microchamber can be arbitrarily changed in accordance with the process of cell culture.