The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2010
Filed:
Aug. 27, 2007
Applicant:
Dong-hyun Han, Gyeonggi-do, KR;
Inventor:
Dong-Hyun Han, Gyeonggi-do, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon-Si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01); G03F 1/14 (2006.01);
U.S. Cl.
CPC ...
Abstract
A photomask includes a first region, a second region and a third region. The first and second regions are spaced apart by the third region. A first photomask type is disposed in the first region and a second photomask type, different from the first photomask type, is disposed in the second region. A dummy photomask pattern is disposed in the third region and is structured to form a dummy wafer pattern on a wafer.
Han, Dong-Hyun. (2010). Hybrid photomask and method of fabricating the same (U.S. Patent No. 7846619). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7846619
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile