The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2010
Filed:
Apr. 05, 2007
Applicants:
Chong-chul Chai, Seoul, KR;
Soo-wan Yoon, Gyeonggi-do, KR;
Shi-yul Kim, Gyeonggi-do, KR;
Joo-ae Youn, Gyeonggi-do, KR;
Inventors:
Chong-Chul Chai, Seoul, KR;
Soo-Wan Yoon, Gyeonggi-do, KR;
Shi-Yul Kim, Gyeonggi-do, KR;
Joo-Ae Youn, Gyeonggi-do, KR;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A multi-tone optical mask includes a substrate, a light-blocking pattern, a first semi-transmitting pattern and a second semi-transmitting pattern. The light-blocking pattern is formed on the substrate. The first semi-transmitting pattern is formed on the substrate. The second semi-transmitting pattern partially overlaps the first semi-transmitting pattern. The multi-tone optical mask has at least five different light-transmittances corresponding to a plurality of areas divided on the substrate.