The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2010
Filed:
Aug. 08, 2005
Uwe Paul Schroeder, Lake Carmel, NY (US);
Klaus Herold, Fishkill, NY (US);
Uwe Paul Schroeder, Lake Carmel, NY (US);
Klaus Herold, Fishkill, NY (US);
Infineon Technologies AG, Munich, DE;
Abstract
Lithography masks and methods of lithography for manufacturing semiconductor devices are disclosed. Forbidden pitches are circumvented by dividing a main feature into a set of two or more sub-features. The sum of the widths of the sub-features and the spaces between the sub-features is substantially equal to the width of the main feature. The set of two or more sub-features comprise a plurality of different distances between an adjacent set of two or more sub-features. At least one of the plurality of distances comprises a pitch that is resolvable by the lithography system, resulting in increased resolution for the main features, improved critical dimension (CD) control, and increased process windows.