The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2010
Filed:
Sep. 14, 2006
Applicants:
Eigo Kawakami, Utsunomiya, JP;
Hirohisa Ota, Kawagoe, JP;
Takashi Nakamura, Edogawa-ku, JP;
Kazuyuki Kasumi, Utsunomiya, JP;
Toshinobu Tokita, Yokohama, JP;
Inventors:
Eigo Kawakami, Utsunomiya, JP;
Hirohisa Ota, Kawagoe, JP;
Takashi Nakamura, Edogawa-ku, JP;
Kazuyuki Kasumi, Utsunomiya, JP;
Toshinobu Tokita, Yokohama, JP;
Assignee:
Canon Kabushiki Kaisha, , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01);
U.S. Cl.
CPC ...
Abstract
A processing method for transferring a relief pattern of a mold to a resist includes the steps of compressing the mold having the relief pattern against the resist on a substrate, irradiating an exposure light onto the resist through the mold, vibrating the mold and the substrate relative to each other during the irradiating step, and releasing the mold from the resist.