The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2010
Filed:
Jul. 13, 2004
Robert S. Condrashoff, Walnut Creek, CA (US);
James P. Fazio, Concord, CA (US);
James D. Getty, Vacaville, CA (US);
James S. Tyler, Galt, CA (US);
Robert S. Condrashoff, Walnut Creek, CA (US);
James P. Fazio, Concord, CA (US);
James D. Getty, Vacaville, CA (US);
James S. Tyler, Galt, CA (US);
Nordson Corporation, Westlake, OH (US);
Abstract
An apparatus for processing a substrate with a plasma. The apparatus includes first and second electrodes positioned with a spaced apart relationship. A separating ring has a vacuum-tight engagement with confronting surfaces of the first electrode and the second electrode to define an evacuatable processing region therebetween. Communicating with the processing region is a process gas port for introducing a process gas to the processing region. The processing region may be evacuated through a vacuum port defined in one of the first and second electrodes to a pressure suitable for exciting a plasma from the process gas in the processing region when the first and second electrodes are powered.