The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2010
Filed:
Mar. 07, 2005
Hisao Morooka, Chuo-ku, JP;
Hideaki Ninomiya, Chuo-ku, JP;
Junichi Shimamura, Chuo-ku, JP;
Kazuo Nishi, Kanagawa, JP;
Hisao Morooka, Chuo-ku, JP;
Hideaki Ninomiya, Chuo-ku, JP;
Junichi Shimamura, Chuo-ku, JP;
Kazuo Nishi, Kanagawa, JP;
TDK Corporation, Tokyo, JP;
Semiconductor Energy Laboratory Co., Ltd., Atsugi-shi, JP;
Abstract
The present invention provides a substrate holding method capable of contributing to improvement in performance of an electronic part. A plastic film is adhered to a holding frame by using an adhesive tape having a proper gas releasing characteristic such that total quantity of gas detected when analysis using gas chromatograph mass spectrometry (dynamic HS-GC-MS) is conducted under test conditions of 180° C. and 10 minutes is 100.5 μg/g or less in n-tetradecane. In the case where the plastic film held by the holding frame is subjected to a process of manufacturing an electronic part (for example, a solar battery), even when a process accompanying generation of heat during the manufacturing process (for example, a film forming process such as plasma CVD) is performed on the plastic film, a release amount of unnecessary gas released from the adhesive tape due to the influence of the heat is suppressed, so that deterioration in the performance of the electronic part caused by the unnecessary gas is suppressed.