The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 30, 2010

Filed:

Feb. 13, 2008
Applicants:

Jae-pil Shin, Suwon-si, KR;

Jin-sook Choi, Suwon-si, KR;

Moon-hyun Yoo, Suwon-si, KR;

Jong-bae Lee, Seongnam-si, KR;

Inventors:

Jae-pil Shin, Suwon-si, KR;

Jin-sook Choi, Suwon-si, KR;

Moon-hyun Yoo, Suwon-si, KR;

Jong-bae Lee, Seongnam-si, KR;

Assignee:

Samsung Electronics Co., Ltd., Suwon-Si, Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G06F 19/00 (2006.01); G03F 1/00 (2006.01); G21K 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A mask set with a light-transmitting region of a controlled size includes a plurality of masks for performing in-situ synthesis on probes of a microarray, wherein each mask includes a light-transmitting region and a light-blocking region, and the size of the light-transmitting region is equal to or greater than about 5% of the total size of the light-transmitting and light-blocking regions.


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