The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2010
Filed:
Mar. 17, 2009
Mitsuyoshi Watanabe, Hashima, JP;
Hidenori Oka, Toukai, JP;
Mitsuyoshi Watanabe, Hashima, JP;
Hidenori Oka, Toukai, JP;
Brother Kogyo Kabushiki Kaisha, Nagoya, JP;
Abstract
The present invention provides an optical system that can reduce the occurrence of aberration, and a scanning retinal display that uses such an optical system. A first diffraction section and the second diffraction section are attached to a light guiding section in a state separated from each other. The first diffraction section diffracts light flux that is incident on it, to be incident on the light guiding section. The light guiding section guides light flux that has been diffracted by the first diffraction section to the second diffraction section using reflection inside the light guiding section. The second diffraction section re-diffracts light flux that has been guided by the light guiding section and output externally of the light guiding section. The first diffraction section, the light guiding section, and the second diffraction section are substantially symmetrical, either side of a virtual plane between the first diffraction section and the second diffraction section.