The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2010
Filed:
Nov. 21, 2005
Mark Damon Wheeler, San Ramon, CA (US);
Richard William Bukowski, Orinda, CA (US);
Jonathan Apollo Kung, San Francisco, CA (US);
Mark Damon Wheeler, San Ramon, CA (US);
Richard William Bukowski, Orinda, CA (US);
Jonathan Apollo Kung, San Francisco, CA (US);
Leica Geosystems AG, Heerbrugg, CH;
Abstract
An improved interface and algorithm(s) can be used to simplify and improve the process for locating an occluded edge from a series of points in a point cloud. An interface can allow the user to select a hint point thought to be near an edge of interest, which can be used to generate an initial edge profile. An interface can allow the user to adjust the fit of the initial profile in cross-section, then can use that profile to generate a profile of the entire edge. A moving fit window can use an imaginary plane to provide an additional constraint, and can utilize a moving average to extend the edge and determine proper end locations. An interface then can display the results of the fit to the user and allow the user to adjust the fit, such as by adjusting the end points of the calculated edge. Such a process can be used to fit linear or curvilinear occluded edges, and can fit a number of irregular shapes as well as regular shaped edges such as 'v-shaped' edges.