The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2010
Filed:
Mar. 07, 2007
Mingda Wang, Fremont, CA (US);
Mingda Wang, Fremont, CA (US);
Varian, Inc, Santa Clara, CA (US);
Abstract
In a method for exciting a precursor ion in an ion trap, the ion is trapped in a nonlinear trapping field that includes a quadrupolar field and a multipole field. The quadrupolar field is generated by applying a radio-frequency (RF) trapping voltage to the ion trap at a trapping amplitude and trapping frequency. A supplemental alternating-current (AC) voltage is applied to the ion trap at a supplemental amplitude and supplemental frequency. The supplemental amplitude is low enough to prevent ejection of the ion from the ion trap, and the supplemental frequency differs from the secular frequency of the ion by an offset amount. One or more operating parameters of the ion trap are adjusted, such that the ion absorbs energy from the supplemental field sufficient to undergo collision-induced dissociation (CID) without being in resonance with the supplemental field.