The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2010
Filed:
Nov. 30, 2007
Tong Gao, Singapore, SG;
Hongyu Chen, Lake Jackson, TX (US);
Alberto Lora Lamia, Trivero, IT;
Yuen-yuen D. Chiu, Pearland, TX (US);
Jerry Chien Ting Wang, Taichung, TW;
Shih-yaw Lai, Pearland, TX (US);
Tong Gao, Singapore, SG;
Hongyu Chen, Lake Jackson, TX (US);
Alberto Lora Lamia, Trivero, IT;
Yuen-Yuen D. Chiu, Pearland, TX (US);
Jerry Chien Ting Wang, Taichung, TW;
Shih-Yaw Lai, Pearland, TX (US);
Dow Global Technologies Inc., Midland, MI (US);
Abstract
Compositions having good wrinkle resistance and other properties when made into garments an be made from an ethylene multi-block copolymers. The resulting fabrics and garments often have good chemical resistance, heat-resistances, and are dimensionally stable.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile