The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2010
Filed:
Jan. 25, 2007
Jin-won Park, Suwon-si, KR;
Ji-won Sohn, Seoul, KR;
Seung-beom Park, Seoul, KR;
Seon-ah Cho, Busan, KR;
Jin-Won Park, Suwon-si, KR;
Ji-Won Sohn, Seoul, KR;
Seung-Beom Park, Seoul, KR;
Seon-Ah Cho, Busan, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
The invention relates to a method of forming an overcoat layer, containing a hydrophobic functional group and a hydrophilic functional group, that omits a post-treatment process after the overcoat layer is formed. The invention also relates to a method of producing a color filter substrate, as well as a color filter substrate and a liquid crystal display produced using the same. The method of forming an overcoat layer includes adding an initiator to polymerizable surfactant monomers, coating the polymerizable surfactant monomers, polymerizing the coated polymerizable surfactant monomers, and forming the overcoat layer through a polymerization reaction of the polymerizable surfactant monomers.