The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 30, 2010

Filed:

Aug. 21, 2008
Applicants:

Chao-hsu Tsai, Hsinchu, TW;

Kuo-chung Huang, Taipei County, TW;

Chun-fu LU, Hsinchu, TW;

Inventors:

Chao-Hsu Tsai, Hsinchu, TW;

Kuo-Chung Huang, Taipei County, TW;

Chun-Fu Lu, Hsinchu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 47/96 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system for manufacturing a micro-retarder and a method for manufacturing the same are provided. The system for manufacturing a micro-retarder includes a carrying device, a heating device and a movement control device. The carrying device is used for carrying a polymolecule film. The polymolecule film is selected from a polymolecule film having an arrangement direction. The heating device is used for providing a heating source. The energy formed in the central area of the heating source is smaller than that in the peripheral area of the heating source. The movement control device is used for controlling the heating source and the polymolecule film to relatively move along a first direction, so that the adjusted heating source heats at least one partial area of the polymolecule film along the first direction and resumes the partial area of the polymolecule film to be non-directional.


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