The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2010
Filed:
Jan. 15, 2009
Mamoru Yorimoto, Tokyo, JP;
Kenichi Kawabata, Kanagawa, JP;
Takayuki Niihara, Kanagawa, JP;
Shinichiro Naruse, Kanagawa, JP;
Tetsu Morino, Kanagawa, JP;
Takumi Hagiwara, Aichi, JP;
Mamoru Yorimoto, Tokyo, JP;
Kenichi Kawabata, Kanagawa, JP;
Takayuki Niihara, Kanagawa, JP;
Shinichiro Naruse, Kanagawa, JP;
Tetsu Morino, Kanagawa, JP;
Takumi Hagiwara, Aichi, JP;
Ricoh Company, Ltd., Tokyo, JP;
Abstract
An image forming apparatus includes a carriage carrying a recording head configured to discharge a droplet. A landing position error detecting pattern is formed on a pattern forming member. Based on a result of reading the landing position error detecting pattern, a landing position error of the droplet discharged by the recording head is corrected. Either a first pattern or a second pattern is selected as the landing position error detecting pattern, depending on a surface condition of the pattern forming member. The first pattern produces a relatively small amount of specular reflection compared with diffused reflection, while the second pattern produces a relatively large amount of specular reflection compared with diffused reflection, upon irradiation with light.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile