The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2010
Filed:
Oct. 03, 2006
Yoshinao Miyata, Nagano-ken, JP;
Kenichi Kitamura, Shiojiri, JP;
Yoshinao Miyata, Nagano-ken, JP;
Kenichi Kitamura, Shiojiri, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
A method for manufacturing a liquid jet head is provided which includes a flow channel board having at least pressure-generating chambers communicating with nozzle holes and a pressure generator above one surface that applies pressure for jetting liquid to the pressure-generating chambers, and a silicon single-crystal reservoir board having at least a reservoir section that communicates with the pressure-generating chambers and that is defined by a through hole passing through the reservoir board and a step with a riser formed so as to open up the through hole at one surface. In the method, a mask pattern having an opening is formed on a reservoir-forming board intended for the reservoir board. The opening has a correction pattern on its wall and a dummy mask pattern is formed in the opening. The correction pattern serves to expose a predetermined crystal plane of the reservoir-firming board to define the riser of the step. The dummy mask pattern has a plurality of separate mask portions and serves to substantially match the etching rate of the reservoir-forming board in the region opposing the correction pattern with the etching rate of the reservoir-forming board in the region opposing the opening of the mask pattern. The reservoir-forming board is anisotropically etched through the mask pattern having the correction pattern and the dummy mask pattern, so that the reservoir section having the step is formed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile