The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2010
Filed:
Apr. 15, 2008
Yoshinori Tabata, Hidaka, JP;
Toshihide Ito, Hidaka, JP;
Takeshi Kawakami, Tokyo, JP;
Tsuyoshi Kashiwagi, Tokyo, JP;
Tsuyoshi Yamauchi, Tokyo, JP;
Yoshinori Tabata, Hidaka, JP;
Toshihide Ito, Hidaka, JP;
Takeshi Kawakami, Tokyo, JP;
Tsuyoshi Kashiwagi, Tokyo, JP;
Tsuyoshi Yamauchi, Tokyo, JP;
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
In order to adjust the optical axis of a light beam Lin an exposure apparatus, on a support body in an XYZ three-dimensional coordinate system are mounted: a first mirrorhaving a reflective surface Mobtained by rotating a plane parallel to the XY plane around an axisparallel to the Y axis by an angle of α; and a second mirrorhaving a reflective surface Mobtained by rotating a plane parallel to the XZ plane around an axisparallel to the X axis by an angle of β. There are provided: position adjustment means for moving the entire support body having the two mirrors parallel to the XY plane; and angle adjustment means for adjusting the angle of the second mirror. The incident light Lis reflected on the reflective surfaces Mand Mto be output as an outgoing light L, where it is possible to perform an optical axis adjustment concerning position and angle by controlling the position adjustment means and the angle adjustment means.