The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2010
Filed:
Feb. 28, 2006
Stephen Vargo, Arcadia, CA (US);
Roman C. Gutierrez, Arcadia, CA (US);
Stephen Vargo, Arcadia, CA (US);
Roman C. Gutierrez, Arcadia, CA (US);
Tessera MEMS Technologies, Inc., Arcadia, CA (US);
Abstract
Systems and techniques for enhanced etch processes. For example, a substrate may be received in an etch chamber, where the substrate comprises a handle layer, a bonding layer in communication with the handle layer, and a device layer in communication with the bonding layer. The device layer may comprise a device layer patterned therein and having a bottom surface, where the bottom surface of the device is attached to the bonding layer. The bonding layer may comprise an oxide annealed at relatively low temperature. A dry etch process may be performed to release the bottom surface of the device from the bonding layer.