The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 23, 2010

Filed:

Apr. 29, 2008
Applicants:

Tea Geol Lee, Daejeon, KR;

Hyegeun Min, Daejeon, KR;

Dae Won Moon, Daejeon, KR;

Inventors:

Tea Geol Lee, Daejeon, KR;

Hyegeun Min, Daejeon, KR;

Dae Won Moon, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 33/53 (2006.01); G01N 33/543 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of evaluating conjugation between materials using imaging of time-of-flight secondary ion mass spectrometry (TOF-SIMS) according to the present invention is carried out by following the steps, a) forming a spontaneous pattern on a substrate with a mixture containing nanoparticles and a conjugation material selected from organic, bio or inorganic material, b) obtaining an ion detection pattern from the conjugation material and nanoparticles, respectively, depending on their position on the substrate by using time-of-flight secondary ion mass spectrometry, and c) determining whether the conjugation is formed between the conjugation material and nanoparticles by comparing the ion detection pattern of the conjugation material with the ion detection pattern of the nanoparticles.


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