The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2010
Filed:
Oct. 20, 2005
Mark Gaydos, Nashua, NH (US);
Prabhat Kumar, Framingham, MA (US);
Steven A. Miller, Canton, MA (US);
Norman C. Mills, Phoenix, AZ (US);
Gary Rozak, Akron, OH (US);
Rong-chein Richard Wu, Chelmsford, MA (US);
Mark Gaydos, Nashua, NH (US);
Prabhat Kumar, Framingham, MA (US);
Steven A. Miller, Canton, MA (US);
Norman C. Mills, Phoenix, AZ (US);
Gary Rozak, Akron, OH (US);
Rong-Chein Richard Wu, Chelmsford, MA (US);
H.C. Starck Inc., Newton, MA (US);
Abstract
Molybdenum titanium sputter targets are provided. In one aspect, the targets are substantially free of the β(Ti, Mo) alloy phase. In another aspect, the targets are substantially comprised of single phase β(Ti, Mo) alloy. In both aspects, particulate emission during sputtering is reduced. Methods of preparing the targets, methods of bonding targets together to produce large area sputter targets, and films produced by the targets, are also provided.