The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2010
Filed:
May. 25, 2005
Applicants:
Manoocher Birang, Los Gatos, CA (US);
Nicolay Y. Kovarsky, Sunnyvale, CA (US);
Bernardo Donoso, San Jose, CA (US);
Inventors:
Manoocher Birang, Los Gatos, CA (US);
Nicolay Y. Kovarsky, Sunnyvale, CA (US);
Bernardo Donoso, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D 21/12 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method and apparatus for measuring differential voltages in an electrolyte of an electrochemical plating cell. Current densities are calculated from the measured differential voltages and correlated to thickness values of plated materials. A real time thickness profile may be generated from the thickness values.
Birang, Manoocher. (2010). In-situ profile measurement in an electroplating process (U.S. Patent No. 7837851). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7837851
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile