The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2010
Filed:
Mar. 28, 2003
Jung-won Kang, Seoul, KR;
Min-jin Ko, Daejeon, KR;
Dong-seok Shin, Seoul, KR;
Gwi-gwon Kang, Seoul, KR;
Myung-sun Moon, Daejeon, KR;
Hye-yeong Nam, Cheongju, KR;
Bum-gyu Choi, Daejeon, KR;
Young-duk Kim, Daejeon, KR;
Byung-ro Kim, Daejeon, KR;
Won-jong Kwon, Daejeon, KR;
Sang-min Park, Daejeon, KR;
Jung-Won Kang, Seoul, KR;
Min-Jin Ko, Daejeon, KR;
Dong-Seok Shin, Seoul, KR;
Gwi-Gwon Kang, Seoul, KR;
Myung-Sun Moon, Daejeon, KR;
Hye-Yeong Nam, Cheongju, KR;
Bum-Gyu Choi, Daejeon, KR;
Young-Duk Kim, Daejeon, KR;
Byung-Ro Kim, Daejeon, KR;
Won-Jong Kwon, Daejeon, KR;
Sang-Min Park, Daejeon, KR;
LG Chem, Ltd., , KR;
Abstract
The present invention relates to an organic silicate polymer prepared by mixing silane compound with organic solvent to prepare a first mixture, and hydrolyzing and condensing the first mixture by adding water and catalyst, the first mixture being selected from a group consisting of oxidized hydrosilane, cyclic siloxane, a second mixture of oxidized hydrosilane and silane or silane oligomer, and a third mixture of cyclic siloxane and silane or silane oligomer, a composition for forming an insulation film of semiconductor devices prepared by using the organic silicate polymer, a method for preparing an insulation film using the composition, and a semiconductor device comprising the insulation film.