The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2010
Filed:
Aug. 21, 2003
Applicants:
Mitsushi Itano, Settsu, JP;
Takashi Kanemura, Settsu, JP;
Shingo Nakamura, Settsu, JP;
Fumihiro Kamiya, Settsu, JP;
Takehiko Kezuka, Settsu, JP;
Inventors:
Mitsushi Itano, Settsu, JP;
Takashi Kanemura, Settsu, JP;
Shingo Nakamura, Settsu, JP;
Fumihiro Kamiya, Settsu, JP;
Takehiko Kezuka, Settsu, JP;
Assignee:
Daikin Industries, Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/50 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention provides a resist-removing solution for low-k film and a cleaning solution for via holes or capacitors, the solutions comprising hydrogen fluoride (HF) and at least one member selected from the group consisting of organic acids and organic solvents. The invention also provides a method of removing resist and a method of cleaning via holes or capacitors by the use of the solutions.