The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2010
Filed:
Jan. 06, 2005
Applicants:
Masaru Mitsui, Yamanashi, JP;
Toshiyuki Suzuki, Yamanashi, JP;
Inventors:
Masaru Mitsui, Yamanashi, JP;
Toshiyuki Suzuki, Yamanashi, JP;
Assignee:
Hoya Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
Abstract
A sputtering target for manufacturing a mask blank having a backing platewhere a portion for bonding a target memberis protruded like the convex with respect to a base portion', and the target memberbeing formed to have a larger surface area than the area of the bonding portion of the backing platewith extending from the bonding portion over a whole periphery with a bonding agentinterposed in-between, and further a metalis deposited to a concave portion formed by a combination of the two structures in such a manner that the elution of the bonding agentcan be sealed.