The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2010
Filed:
Dec. 21, 2007
Andreas W. Dreher, Escondido, CA (US);
Bill Foote, San Diego, CA (US);
Dave Sandler, San Diego, CA (US);
Laurence Warden, Poway, CA (US);
Andreas W. Dreher, Escondido, CA (US);
Bill Foote, San Diego, CA (US);
Dave Sandler, San Diego, CA (US);
Laurence Warden, Poway, CA (US);
Ophthonix, Inc., Vista, CA (US);
Abstract
Embodiments of the invention pertain to a method for producing a spectacle lens with optimal correction across the entire lens taking into account the patient's complete measured wavefront. Specific embodiments can also take into account one or more additional factors such as vertex distance, SEG height, pantoscopic tilt, and use conditions. The lens wavefront can be achieved by optimizing a corrected wavefront, where the corrected wavefront is the combined effect of the patient's measured wavefront and the lens wavefront. The optimization of the corrected wavefront can involve representing the measured wavefront and the lens wavefront on a grid. In an embodiment, the grid can lie in a plane. During the optimization, a subset of the grid can be used for the representation of the measured wavefront at a point on the grid so as to take into account the portions of the measured wavefront that contribute to the corrected wavefront at that point on the grid.