The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 09, 2010

Filed:

Sep. 11, 2007
Applicant:

Eugene Wang, Shanghai, CN;

Inventor:

Eugene Wang, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/18 (2006.01);
U.S. Cl.
CPC ...
Abstract

Method and system for yield similarity of semiconductor devices. Embodiments of the present invention provides a method for yield similarity of semiconductor devices. The method includes providing a first plurality of semiconductor devices and a second plurality of semiconductor devices. The method also includes obtaining a first plurality of yields associated with a first yield related to the first plurality of semiconductor devices. The method further includes obtaining a second plurality of yields associated with a second yield related to the second plurality of semiconductor devices. The method also includes providing a processor and performing a first statistical analysis for the first plurality of yields using at least the processor. The method includes determining a first statistical distribution based on at least information associated with the first statistical analysis. The method includes performing a second statistical analysis for the second plurality of yields.


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