The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 09, 2010

Filed:

Nov. 25, 2008
Applicants:

Robert A. Sprague, Saratoga, CA (US);

Yi-shung Chaug, Cupertino, CA (US);

Hongmei Zang, Sunnyvale, CA (US);

Xiaojia Wang, Fremont, CA (US);

Gary Kang, Fremont, CA (US);

Inventors:

Robert A. Sprague, Saratoga, CA (US);

Yi-Shung Chaug, Cupertino, CA (US);

HongMei Zang, Sunnyvale, CA (US);

Xiaojia Wang, Fremont, CA (US);

Gary Kang, Fremont, CA (US);

Assignee:

SiPix Imaging, Inc., Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/00 (2006.01); G02F 1/03 (2006.01); G02F 1/29 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to a process for manufacturing a brightness enhancement structure comprising micro-reflectors. The process comprises forming an array of micro-structures by embossing; and depositing a metal layer over the surface of the micro-structures. The present invention also relates to a process for manufacturing a display device comprising micro-reflectors. The present invention further relates to a display device comprising micro-reflectors.


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