The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 09, 2010

Filed:

Jul. 01, 2005
Applicants:

Daniel F. Sievenpiper, Santa Monica, CA (US);

Joseph S. Colburn, Malibu, CA (US);

Bryan Ho Lim Fong, Los Angeles, CA (US);

Matthew W. Ganz, Marina del Rey, CA (US);

Mark F. Gyure, Oak Park, CA (US);

Jonathan J. Lynch, Oxnard, CA (US);

John Ottusch, Malibu, CA (US);

John L. Visher, Malibu, CA (US);

Inventors:

Daniel F. Sievenpiper, Santa Monica, CA (US);

Joseph S. Colburn, Malibu, CA (US);

Bryan Ho Lim Fong, Los Angeles, CA (US);

Matthew W. Ganz, Marina del Rey, CA (US);

Mark F. Gyure, Oak Park, CA (US);

Jonathan J. Lynch, Oxnard, CA (US);

John Ottusch, Malibu, CA (US);

John L. Visher, Malibu, CA (US);

Assignee:

HRL Laboratories, LLC, Malibu, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01Q 1/38 (2006.01);
U.S. Cl.
CPC ...
Abstract

An artificial impedance structure and a method for manufacturing same. The structure contains a dielectric layer having generally opposed first and second surfaces, a conductive layer disposed on the first surface, and a plurality of conductive structures disposed on the second surface to provide a preselected impedance profile along the second surface.


Find Patent Forward Citations

Loading…