The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2010
Filed:
Nov. 18, 2005
Kenjiro Kimura, Kyoto, JP;
Kei Kobayashi, Kyoto, JP;
Hirofumi Yamada, Kyoto, JP;
Kazumi Matsushige, Kyoto, JP;
Kenjiro Kimura, Kyoto, JP;
Kei Kobayashi, Kyoto, JP;
Hirofumi Yamada, Kyoto, JP;
Kazumi Matsushige, Kyoto, JP;
Kyoto University, Kyoto, JP;
Abstract
An electron beam irradiation device of the present invention includes: a projectorfor generating a two-dimensional light pattern; a microchannel platefor (i) generating an electron beam array based on the light patternhaving entered, (ii) amplifying the electron beam array, and (iii) emitting the electron beam array as an amplified electron beam array; and an electron beam lens sectionfor converging the amplified electron beam array. This electron beam irradiation device is capable of manufacturing a semiconductor device whose performance is improved through a finer processing by means of irradiation using an electron beam. Further, the electron beam irradiation device allows cost reduction, because the device allows collective irradiation using a two dimensional pattern.