The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2010
Filed:
Oct. 20, 2005
Applicants:
Tsuyoshi Fukuhara, Hokkaido, JP;
Shoji Hara, Hokkaido, JP;
Toshio Hidaka, Ibaraki, JP;
Inventors:
Assignees:
National University Corporation, Hokkaido, JP;
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C07C 209/68 (2006.01); C07C 209/74 (2006.01);
U.S. Cl.
CPC ...
Abstract
A process for producing an α,α-difluoroamine which comprises using hydrogen fluoride and a Lewis base in specific amounts in the halogen-fluorine exchange reaction using an α,α-dihaloamine as the substrate. The process can be industrially applied, enables to obtain the object compound in a short time at a great yield and can be conducted easily with excellent productivity.