The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2010
Filed:
Dec. 07, 2007
Sang-jeoung Kim, Incheon, KR;
Hyo-jung Roh, Hwaseong-Si, KR;
Jong-kyoung Park, Hwaseong-Si, KR;
Jeong-sik Kim, Hwaseong-Si, KR;
Hyun-jin Kim, Hwaseong-Si, KR;
Jae-hyun Kim, Seoul, KR;
Sang-Jeoung Kim, Incheon, KR;
Hyo-Jung Roh, Hwaseong-Si, KR;
Jong-Kyoung Park, Hwaseong-Si, KR;
Jeong-Sik Kim, Hwaseong-Si, KR;
Hyun-Jin Kim, Hwaseong-Si, KR;
Jae-Hyun Kim, Seoul, KR;
Dongjin Semichem Co., Ltd., Incheon, KR;
Abstract
A polymer which has siloxane group at a main chain thereof and a composition including the same, for forming an organic anti-reflective coating layer are disclosed. The polymer for forming an organic anti-reflective coating layer is represented by following Formula. In Formula, R is hydrogen atom, C˜Calkyl group, C˜Calcohol group or epoxy group, Ris independently hydrogen atom, n is an integer of 1-50, Ris C˜Calkyl group, C˜Ccycloalkyl group, C˜Caryl group or C˜Carylalkyl group, Ris hydrogen atom, C˜Calcohol group or epoxy group and POSS is a polyhedral oligosilsesquioxane.