The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2010
Filed:
Oct. 23, 2008
Winsor Lam, Daly City, CA (US);
Tza-jing Gung, San Jose, CA (US);
Hong S. Yang, Pleasanton, CA (US);
Adolph Miller Allen, Oakland, CA (US);
Winsor Lam, Daly City, CA (US);
Tza-Jing Gung, San Jose, CA (US);
Hong S. Yang, Pleasanton, CA (US);
Adolph Miller Allen, Oakland, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods for processing substrates are provided herein. In some embodiments, a method for processing substrates includes providing to a process chamber a substrate comprising an exposed dielectric layer having a feature formed therein. A mask layer comprising titanium nitride may be selectively deposited atop corners of the feature. A barrier layer may be selectively deposited atop the mask layer and into a bottom portion of the feature. The barrier layer deposited on the bottom portion of the feature may be etched to redistribute at least a portion of the barrier layer onto sidewalls of the feature.