The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 09, 2010

Filed:

Sep. 17, 2007
Applicants:

Bernabe J. Arruza, Boca Raton, FL (US);

Ronald Bozak, Delray Beach, FL (US);

Kenneth Gilbert Roessler, Boca Raton, FL (US);

Andrew Dinsdale, Lake Worth, FL (US);

Tod Evan Robinson, Boynton Beach, FL (US);

David Brinkley, Baltimore, MD (US);

Inventors:

Bernabe J. Arruza, Boca Raton, FL (US);

Ronald Bozak, Delray Beach, FL (US);

Kenneth Gilbert Roessler, Boca Raton, FL (US);

Andrew Dinsdale, Lake Worth, FL (US);

Tod Evan Robinson, Boynton Beach, FL (US);

David Brinkley, Baltimore, MD (US);

Assignee:

Rave, LLC, Delray Beach, FL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of nanomachining is provided. The method includes plunging a nanometer-scaled tip into a surface of a substrate at a first location in a first direction that is substantially perpendicular to the surface, thereby displacing a first portion of the substrate with the tip. The method also includes withdrawing the tip from the substrate in a second direction that is substantially opposite to the first direction. The method further includes moving at least one of the tip and the substrate laterally relative to each other. In addition, the method also includes plunging the tip into the substrate at a second location in a third direction that is substantially parallel to the first direction, thereby displacing a second portion of the substrate with the tip and withdrawing the tip from the substrate in a fourth direction that is substantially opposite to the third direction.


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