The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2010
Filed:
Aug. 09, 2007
Yizhong Wang, Woodbury, MN (US);
Hai Sun, Milpitas, CA (US);
Hongping Yuan, Fremont, CA (US);
Winnie Yu, San Jose, CA (US);
Yizhong Wang, Woodbury, MN (US);
Hai Sun, Milpitas, CA (US);
Hongping Yuan, Fremont, CA (US);
Winnie Yu, San Jose, CA (US);
Western Digital (Fremont), LLC, Fremont, CA (US);
Abstract
A method and system for providing a microelectric device are described. The method and system include providing a photoresist layer having a surface. The method and system also include setting a focus range and exposing the photoresist layer over the focus range to form a photoresist mask having a trench therein. The focus range corresponding to a plurality of focus distances. The focus range also corresponds to a nonzero angle to be formed in the photoresist layer and to the structure. The trench has at least one sidewall that forms the angle with a normal to the surface. The method and system also include providing the structure utilizing the trench.