The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 02, 2010

Filed:

Jan. 23, 2006
Applicants:

Daphne Yu, Yardley, PA (US);

Robert Schneider, Roβtal, DE;

Inventors:

Daphne Yu, Yardley, PA (US);

Robert Schneider, Roβtal, DE;

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

This invention describes an optimization and view dependency reduction method for multiplanar reformatting (MPR) of slice-based volume images. This method utilizes a traversal scheme that allows for efficient access of the computer memory layout of a sliced based volume, and therefore optimizes overall processing time. This method does not require changes to the volume memory layout or additional volume memory. Instead, efficient memory access is achieved by adaptive traversal patterns on the reformatting planes. The traversal pattern is adapted on-the-fly during rendering as the reformatting plane location and orientation is changed arbitrarily relative to the volume. In this way, the typical speed differences between various reformatting planes orientations caused by inefficient memory access is greatly reduced. Computer cache coherency, SIMD coherent implementation, and multiprocessing environments are also considered in the design of the traversal pattern.


Find Patent Forward Citations

Loading…