The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2010
Filed:
Jul. 17, 2008
Jerome Primot, Chatillon, FR;
Nicolas Guerineau, Antony, FR;
Sabrina Velghe, Ville-bon-sur-yvette, FR;
Jerome Primot, Chatillon, FR;
Nicolas Guerineau, Antony, FR;
Sabrina Velghe, Ville-bon-sur-yvette, FR;
ONERA (Office National d'Etudes et de Recherches Aerospatiales), Chatillon, FR;
Abstract
A method and a system for analyzing the wavefront of a light beam, wherein a diffraction grating is arranged in a plane perpendicular to the light beam to be analyzed and optically conjugated to the analysis plane. Different emerging beams of the grating interfere to generate an image having deformations linked to the gradients of the wavefront to be analyzed. The method is characterized in that the grating carries out the multiplication of an intensity function which is implemented by a two-dimensional grating with hexagonal meshing of surface S transmitting the light of the beam to be analyzed into plural emerging beams arranged in a hexagonal meshing, by an phase function which is implemented by a two-dimensional grating with hexagonal meshing of surfaceS which introduces a phase shift close to 2π/3 (modulo 2π) between two adjacent secondary beams.