The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2010
Filed:
Feb. 23, 2007
Hideaki Nihongi, Hitachi, JP;
Koji Matsuda, Hitachi, JP;
Kazuo Hiramoto, Hitachiohta, JP;
Hiroshi Akiyama, Hitachiohta, JP;
Hideaki Nihongi, Hitachi, JP;
Koji Matsuda, Hitachi, JP;
Kazuo Hiramoto, Hitachiohta, JP;
Hiroshi Akiyama, Hitachiohta, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A charged particle beam irradiation system and a charged particle beam extraction method which can prevent erroneous irradiation of a charged particle beam in the direction of advance of the charged particle beam. The system and method are featured in stopping supply of an ion beam to one or more of a plurality of angle zones in each of which a target dose is attained, the angle zones being formed by dividing an RMW in a rotating direction thereof, and in allowing the supply of the ion beam to one or more other angle zones in each of which a target dose is not yet attained. The invention can easily adjust beam doses at various positions in an affected part of the patient body in the direction of advance of the ion beam, and can greatly reduce the probability of erroneous irradiation that the beam dose becomes excessive or deficient at the various positions within the affected part of the patient body in the direction of advance of the ion beam.