The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 02, 2010

Filed:

Sep. 27, 2005
Applicants:

John Meijer, Deventer, NL;

Leonardus Bernardus Gerhardus Maria Nijhof, Enter, NL;

Herman Evert Roelofs, Epse, NL;

Haimo Tonnaer, Deventer, NL;

Roelof Van DE Worp, Deventer, NL;

Inventors:

John Meijer, Deventer, NL;

Leonardus Bernardus Gerhardus Maria Nijhof, Enter, NL;

Herman Evert Roelofs, Epse, NL;

Haimo Tonnaer, Deventer, NL;

Roelof Van De Worp, Deventer, NL;

Assignee:

Akzo Nobel N.V., Arnhem, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07D 323/00 (2006.01); C08J 3/24 (2006.01); C08K 5/159 (2006.01);
U.S. Cl.
CPC ...
Abstract

Process to prepare a trioxepane compound of the following formula (I) comprising less than 3.5 wt % of dialkyl peroxide based on the total amount of peroxides, said process comprising the steps of reacting a glycol compound of the formula RCHOH—CH—C(CH)OH with hydrogen peroxide in the presence of an acid to form a glycol hydroperoxide, purifying the glycol hydroperoxide, reacting the purified glycol hydroperoxide with a ketone or aldehyde of the formula RRCO in the presence of an acid to form the trioxepane compound, and purifying the trioxepane compound, wherein R, R, and Rare independently selected from hydrogen and a substituted or unsubstituted hydrocarbyl group, with the proviso that if Rand Rare both methyl groups, Ris not hydrogen. Initiator compositions comprising the so-prepared trioxepane compound are characterized by a high safe processing temperature in combination with a good crosslink efficiency.


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