The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2010
Filed:
Apr. 28, 2005
Applicants:
Zhigang Fan, Webster, NY (US);
Stuart Schweid, Pittsford, NY (US);
Jeng-nan Shiau, Webster, NY (US);
Inventors:
Zhigang Fan, Webster, NY (US);
Stuart Schweid, Pittsford, NY (US);
Jeng-nan Shiau, Webster, NY (US);
Assignee:
Xerox Corporation, Norwalk, CT (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/36 (2006.01); G09G 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed is a method and system for processing image data, which may be generated by a scanning subsystem, and the segmentation and treatment of leaky windows or segments within the image. In addition to the identification of window regions or segments having leaky boundaries, the method and system include the subsequent control of enhancement and other image processing techniques applied to such images so as to reduce or eliminate artifacts that result from the processing of leaky window regions.