The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2010
Filed:
Dec. 23, 2008
Kenji Yamazoe, Berkeley, CA (US);
Yuki Oshima, Utsunomiya, JP;
Kenji Yamazoe, Berkeley, CA (US);
Yuki Oshima, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A measurement method for measuring a shape of a target using an interference pattern includes the steps of converting a first interference pattern into a first shape of the target (Sto S), obtaining a second interference pattern at a position where the target moves in an optical axis direction of the reference surface (S, S), unwrapping the second interference pattern after aligning a phase of the first interference pattern with a phase of the second interference pattern (S), converting the unwrapped second interference pattern into a second shape of the target (S), determining whether or not the first shape of the target coincides with the second shape (S), and calculating the shape of the target by adding the integral multiple of a wavelength of the light source to the unwrapped second interference pattern if the first shape does not coincide with the second shape (S).